scia Clean 1500

Used to clean larger three-dimensional shaped substrates via vacuum description, thermal desorption and plasma treatment; the scia Clean 1500 is designed for applications such as the ultra-high purity cleaning of medical objects or optical components.

Separate cleaning systems for the substrate and chamber are available with the scia Clean 1500, ensuring an optimum base pressure, using mass spectroscopy measurement for quantifying small residual contaminations on the substrate. Plasma source quantities can be selected according to customer requirements, improving the cleaning process. The transfer system is used for substrates up to a weight of three tonnes.

Key Features:

• Low base pressure and fast pumping due to electropolished and heated vacuum chamber
• Separate substrate heating for improved desorption
• Qualification of residual contamination by high-sensitive mass spectroscopy
• Selectable quantity of plasma sources for advanced cleaning with H₂ plasma
• Recipes for repeatable temperature ramps and fully automated cleaning cycles
• Transfer system for loading of heavy substrates